Continuing good HD oxide, even across a chamber clean

Recipe "HDP-SiO2"

We ran 6 wafers targeting 5000 A, 2 before a chamber plasma clean, 4 after.  Measurements this run were 55 pt Woollam.

The dep rate and uniformity continue to be ~1%.  The current dep rate estimate is 27.66 A/sec, consistent with previous values of

27.72 and 27.58.  Remember to include the 6 sec of "strike" in the rate calculations

The 1st wafer after the clean was 0.68% thicker than the averages (= 2 sigma of wafer avgs, nearly a significant difference).

Those few interested in this spreadsheet, please ask.

Douglas Tham participated in the depositions and measurements.

Thanks to Jim McVittie, Nancy and Elmer, and to SNF for a marvelous new tool.

Also to Ed Myers for the Woollam, making these measurements possible.

jim