Re: Al2O3 etching

Max,

Back in 2006 with ALD A2O3 from our modified Spectrum CVD system, we used the following recipe in the P5000.

(BCl3=40/Cl2=10/N2=40/200mT/300W/0G).

cleared about 200A of ALD-Al2O3 in 45 seconds (266A/min).

Jim

----- Original Message -----
From: "Max Marcel Shulaker" <maxms@stanford.edu>
To: "labmembers" <labmembers@snf.stanford.edu>
Sent: Tuesday, October 30, 2012 1:25:48 PM
Subject: Al2O3 etching

Hello everyone,
Hope it's a happy tuesday for you. I was wondering if someone had experience dry etching Al2O3 from a fiji ALD chamber? I have some recipes, but am wondering what other people use and what etch rates they get, etc. Right now, I use BCL3/Cl2 on pquest, but am worried about the chloride and nasty residues left behind...
Thanks!
-Max